发明名称 BANDGAP ENGINEERED MOS-GATED POWER TRANSISTORS
摘要 <p>Devices, methods, and processes that improve immunity to transient voltages and reduce parasitic impedances. Immunity to unclamped inductive switching events is improved. For example, a trench-gated power MOSFET device having a SiGe source is provided, where the SiGe source reduces parasitic npn transistor gain by reducing hole current in the body or well region, thereby decreasing the likelihood of a latch-up condition. A body tie on this device can also be eliminated to reduce transistor cell size. A trench-gated power MOSFET device having a SiGe body or well region is also provided. A SiGe body reduces hole current when the body diode is turned on, thereby reducing reverse recovery power losses. Device characteristics are also improved. For example, parasitic gate impedance is reduced through the use of a poly SiGe gate, and channel resistance is reduced through the use of a SiGe layer near the device's gate.</p>
申请公布号 WO2006042040(A3) 申请公布日期 2007.02.22
申请号 WO2005US36036 申请日期 2005.10.07
申请人 FAIRCHILD SEMICONDUCTOR CORPORATION;DOLNY, GARY;WANG, QI;HO, IHSIU 发明人 DOLNY, GARY;WANG, QI;HO, IHSIU
分类号 H01L31/00 主分类号 H01L31/00
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