| 摘要 |
PROBLEM TO BE SOLVED: To inexpensively provide a one-sheet diffraction grating which has flat diffraction efficiency characteristic over a wide wavelength range and to facilitate design and adjustment of a spectroscope. SOLUTION: A photoresist diffraction grating pattern 21 is manufactured according to a holographic exposure method by two beam interference on a substrate made by forming a photoresist layer 2 on the surface of a substrate 1. A metal mask of which a window (region A) of 60% of the total area is opened is tightly attached onto a substrate 31 and the etching is performed by applying ion beam. A depression angle of a prepared glass diffraction grating pattern has a depression angle of 7.6°. Again, a metal mask 6 of which a window (region B) of 40% of the total area is opened is tightly attached onto a substrate 31 and the etching is performed by applying ion beam at an angle different from the angle above mentioned. A depression angle of a prepared glass diffraction grating pattern has a depression angle of 21°. The diffraction grating thus manufactured exhibits the flat characteristic over the whole region as the result of measuring the diffraction efficient of 200 nm to 800 nm. COPYRIGHT: (C)2007,JPO&INPIT
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