etching apparatus for semiconductor device manufacturing,申请号KR20050074751-传众专利搜索

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发明名称	etching apparatus for semiconductor device manufacturing
摘要
申请公布号	KR20070020636(A)	申请公布日期	2007.02.22
申请号	KR20050074751	申请日期	2005.08.16
申请人		发明人
分类号	H01L21/3065	主分类号	H01L21/3065
代理机构		代理人
主权项
地址

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