| 摘要 |
PROBLEM TO BE SOLVED: To provide a small sample preparing device and evaluating device having operability equivalent to that of a conventional device, by applying a probe moving mechanism for a large-diameter wafer and a side entry type sample stage to the sample preparing device and a failure inspection device. SOLUTION: The probe moving mechanism and a fine-moving mechanism of the side entry type sample stage are used which have a vacuum introducing means capable of taking in or out the probe and side entry type sample stage from a vacuum vessel without opening the vacuum vessel to the atmosphere with a tilt angle passing the intersection of the ion beam irradiation optical axis and a wafer face. The side entry type sample stage having a degree of rotation freedom for making a sample piece installation part of a sample holder of the side entry type sample stage parallel to the wafer face is used. The sample preparing device for the large-diameter wafer and the evaluating device can be achieved that require necessary minimum volume of the vacuum vessel, require small installation area, are small, and are user-friendly. COPYRIGHT: (C)2007,JPO&INPIT
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