发明名称 Lithographic apparatus and device manufacturing method
摘要 A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
申请公布号 US2007040133(A1) 申请公布日期 2007.02.22
申请号 US20060371235 申请日期 2006.03.09
申请人 ASML NETHERLANDS B.V. 发明人 LOF JOERI;DE SMIT JOANNES T.;RITSEMA ROELOF AEILKO S.;SIMON KLAUS;MODDERMAN THEODORUS M.;MULKENS JOHANNES CATHARINUS H.;MEIJER HENDRICUS JOHANNES M.;LOOPSTRA ERIK ROELOF
分类号 G01N21/86;G01V8/00;G03F7/20;G03F9/00;H01L21/027 主分类号 G01N21/86
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