发明名称 |
METHOD OF MANUFACTURING MEMORY DEVICE FOR STABILIZING RESET CURRENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a memory device for reducing and stabilizing a reset current. <P>SOLUTION: The method of manufacturing the memory device that has an oxide layer formed of a resistance converted material to reduce and stabilize the reset current comprises a step of, after forming a lower electrode and an oxide layer on a lower structure, irradiating one region of the oxide layer with an electric beam or ion beam. This reduces and stabilizes the reset current of the memory device. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007049156(A) |
申请公布日期 |
2007.02.22 |
申请号 |
JP20060215938 |
申请日期 |
2006.08.08 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
AHN SEUNG-EON;KIM HYE-YOUNG;PARK BYOUNG-HO;YUN JUNG-BIN;KIM YOU-SEON |
分类号 |
H01L27/10;H01L45/00;H01L49/00 |
主分类号 |
H01L27/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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