发明名称 METHOD OF MANUFACTURING MEMORY DEVICE FOR STABILIZING RESET CURRENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a memory device for reducing and stabilizing a reset current. <P>SOLUTION: The method of manufacturing the memory device that has an oxide layer formed of a resistance converted material to reduce and stabilize the reset current comprises a step of, after forming a lower electrode and an oxide layer on a lower structure, irradiating one region of the oxide layer with an electric beam or ion beam. This reduces and stabilizes the reset current of the memory device. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007049156(A) 申请公布日期 2007.02.22
申请号 JP20060215938 申请日期 2006.08.08
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 AHN SEUNG-EON;KIM HYE-YOUNG;PARK BYOUNG-HO;YUN JUNG-BIN;KIM YOU-SEON
分类号 H01L27/10;H01L45/00;H01L49/00 主分类号 H01L27/10
代理机构 代理人
主权项
地址