发明名称 HIGH PURITY NICKEL, HIGH PURITY NICKEL TARGET, AND HIGH PURITY NICKEL THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide technology that efficiently manufactures high purity nickel having a purity of 5N(99.999 wt.%) or more regarding a simple method of performing electrolytic refining employing a solution containing nickel from nickel raw material containing a substantial amount of impurities. SOLUTION: Upon performing electrolysis with a solution containing nickel as the electrolytic solution, anolyte is adjusted to pH 2 to 5; impurities such as iron, cobalt and copper contained in the anolyte are eliminated by combining any one or two or more of the methods among methods adding an oxidizing agent 7 and precipitating and eliminating the impurities as hydroxide, eliminating the impurities through preliminary electrolysis, or adding Ni foil and eliminating the impurities through displacement reaction; impurities are thereafter further eliminated with a filter 8; and the impurity-free solution is employed as catholyte to perform the electrolysis. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007046157(A) 申请公布日期 2007.02.22
申请号 JP20060193571 申请日期 2006.07.14
申请人 NIKKO KINZOKU KK 发明人 SHINDO YUICHIRO;TAKEMOTO KOICHI
分类号 C22C19/03;C23C14/34;C25C1/08 主分类号 C22C19/03
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