发明名称 TEMPERATURE CONTROL DEVICE IN VACUUM VESSEL, AND THIN FILM DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a temperature control device in a vacuum vessel where a member can be controlled to the vicinity of a set temperature or below the set temperature in a vacuum vessel, and to provide a thin film deposition method. SOLUTION: The temperature control device in a vacuum vessel performing prescribed treatment in a vacuum atmosphere has a structure where the inside of a member 8 composing the vacuum vessel involves a phase change material 11 having a melting point in the vicinity of the treatment temperature. At this time, the phase change material is composed of a low melting point alloy essentially consisting of any element selected from In, Sb, Bi and Pb, and having a melting point of about 10 to 327°C. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007046091(A) 申请公布日期 2007.02.22
申请号 JP20050230489 申请日期 2005.08.09
申请人 CANON INC 发明人 TAKAGI SATOSHI
分类号 C23C14/54;C23C16/52;H01L21/31;H01L21/316 主分类号 C23C14/54
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