| 摘要 |
A method for fabricating a solar cell device is provided to improve solar cell efficiency by using a uniform impurity doping process. A sample(1) is cleaned through an ultra violet dry cleaning process. A texture mask pattern(4) having a width of 1 to 10 micro-meter is attached to a sample(3) after a both-side dry etching process. The sample is dry-etched. Impurities having a uniform thickness of 0.1 to 1.0 micro-meter is implanted into a three-dimensional texture pattern of the dry-etched sample(5) through a plasma doping process. The doped sample(6) is processed by a heating process to activate the impurities. A dielectric for protecting and anti-reflection of a solar cell is formed through a plasma chemical deposition. |
