发明名称 APPARATUS FOR ANALYZING ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for analyzing an element with high sensitivity and high accuracy. SOLUTION: A plasma torch 2 has a conical plasma chamber 2d pointed toward the forward end. In addition, a cold coil 3 for applying high frequency is arranged around the plasma chamber 2d. A plasma 4 is generated in the plasma chamber by applying a high frequency (27.12 MHz) from the cold coil 3 while feeding Ar. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007047185(A) 申请公布日期 2007.02.22
申请号 JP20060274813 申请日期 2006.10.06
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 KUROSAWA MASARU;ISHII YOSHIICHI;HORII KIYOYUKI
分类号 G01N21/73;G01N27/62 主分类号 G01N21/73
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