发明名称 |
APPARATUS FOR ANALYZING ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for analyzing an element with high sensitivity and high accuracy. SOLUTION: A plasma torch 2 has a conical plasma chamber 2d pointed toward the forward end. In addition, a cold coil 3 for applying high frequency is arranged around the plasma chamber 2d. A plasma 4 is generated in the plasma chamber by applying a high frequency (27.12 MHz) from the cold coil 3 while feeding Ar. COPYRIGHT: (C)2007,JPO&INPIT
|
申请公布号 |
JP2007047185(A) |
申请公布日期 |
2007.02.22 |
申请号 |
JP20060274813 |
申请日期 |
2006.10.06 |
申请人 |
NIPPON TELEGR & TELEPH CORP <NTT> |
发明人 |
KUROSAWA MASARU;ISHII YOSHIICHI;HORII KIYOYUKI |
分类号 |
G01N21/73;G01N27/62 |
主分类号 |
G01N21/73 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|