| 摘要 |
PROBLEM TO BE SOLVED: To provide a titanium material for sputtering in which a cast ingot is used as a starting raw material, and this titanium material has clean macro-structure and fine micro-structure and the defect on a surface layer is little and good upsetting forgeability is provided. SOLUTION: In a method for producing the titanium material used for sputtering target, by finish-forging into round columnar state as the finish-shape, a primary forging composed of a square columnar forging is performed by using the cast ingot as the starting raw material and using flat dies with a warm forging and successively and a secondary forging composed of the round columnar forging is performed by using round-recessed dies with the warm forging to obtain the finish round columnar shape. It is desirable that the warm forging is performed in the temperature range of 500°C toβtransformation temperature. Further, since this titanium material is used for sputtering target, it is desirable that the purity of the material to be forged is≥99.98% excluding gas impurities. COPYRIGHT: (C)2007,JPO&INPIT
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