DEVICE FOR WASHING NOZZLE AND METHOD

摘要

A device for cleaning a nozzle and a cleaning method of the same are provided to remove residual photoresist from a lip part of a slit nozzle by performing continuously a wet-cleaning process, a contact-cleaning process, and a drying process. A first cleaning unit(100) injects a cleaning solution to a lip part of a slit nozzle. A second cleaning unit(200) comes in contact with the lip part of the slit nozzle in order to remove foreign materials therefrom. A third cleaning unit(300) injects dry air to the lip part of the slit nozzle. A main block(400) is moved relatively to the slit nozzle along a slit direction of the slit nozzle. The main blocks are sequentially installed in an approaching direction of each of the cleaning units into the lip part of the slit nozzle.