发明名称 PHOTOSENSITIVE FILM, METHOD FOR PRODUCING THE SAME AND PERMANENT PATTERN FORMING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive film containing an appropriate amount of an organic solvent in a photosensitive layer, having small surface tackiness, good laminating property and handleability, and excellent in conformability to a substrate; and also to provide a method for producing the photosensitive film, and a permanent pattern forming method using the photosensitive film. <P>SOLUTION: The photosensitive film comprises a support and the photosensitive layer thereon formed of a photosensitive composition comprising a binder, a polymerizable compound, a photopolymerization initiator, a heat crosslinking agent and the organic solvent, wherein the content of the organic solvent in the photosensitive layer is 0.01-3 mass%. The method for producing the photosensitive film and the permanent pattern forming method using the photosensitive film are also provided. The organic solvent is preferably two or more organic solvents different from each other in boiling point. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007047771(A) 申请公布日期 2007.02.22
申请号 JP20060191748 申请日期 2006.07.12
申请人 FUJIFILM CORP 发明人 KAMIKAWA HIROSHI
分类号 G03F7/004;G03F7/027;G03F7/038;H05K3/28;H05K3/46 主分类号 G03F7/004
代理机构 代理人
主权项
地址