| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a power supply and a system for sputtering for forming a highly reliable film with high efficiency by suppressing abnormal discharge such as arc discharge, and preventing debris. <P>SOLUTION: One embodiment includes a sputtering system that includes a vacuum chamber; a substrate transport system configured to transport a substrate through the vacuum chamber; a cathode for supporting a sputtering target, the cathode at least partially inside the vacuum chamber; and a power supply configured to supply power to the cathode and the power supply configured to output a modulated power signal. Depending upon the implementation, the power supply can be configured to output an amplitude-modulated power signal; a frequency-modulated power signal; a pulse-width power signal; a pulse-position power signal; a pulse-amplitude modulated power signal; or any other type of modulated power or energy signal. <P>COPYRIGHT: (C)2007,JPO&INPIT |
