发明名称 METHOD FOR GENERATING WIRING PATTERN AND METHOD FOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a wiring pattern generating method capable of precisely and stably generating a thin, linear, and fine pattern, and to provide a device manufacturing method. SOLUTION: A partition structural body comprises: a gate electrode groove part 56a whose width is smaller than the flight diameter of a function liquid L; and a gate electrode auxiliary groove part 57a, formed on a part of the gate electrode groove part 56a, whose width is not less than the flight diameter of the function liquid L and which has a circular arcuate shape in at least a part of the outer periphery. The wiring pattern generating method comprises: a process for arranging the function liquid L inside the gate electrode auxiliary groove part 57a; and a process for forming a gate electrode assisting part in the electrode auxiliary groove part 57a with the use of the function liquid L and forming a gate electrode, which is connected to the gate electrode assisting part, in the gate electrode groove part 56a by the capillarity of the function liquid L. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007049173(A) 申请公布日期 2007.02.22
申请号 JP20060245756 申请日期 2006.09.11
申请人 SEIKO EPSON CORP 发明人 HIRAI TOSHIMITSU;SAKAI MARI
分类号 H01L21/3205;G02F1/1343;G02F1/1368;H01L21/336;H01L29/786;H01L51/50;H05B33/10 主分类号 H01L21/3205
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