发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in developability and curability. <P>SOLUTION: The alkali developable photosensitive resin composition contains a hydrophilic polymer (A) having a hydroxyl group, a polyfunctional acrylate monomer (B), a photopolymerization initiator (C) and one or more crosslinking agents (D) selected from the group consisting of a blocked polyisocyanate (D1) and a urethodione body of a polyisocyanate (D2). <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007047209(A) 申请公布日期 2007.02.22
申请号 JP20050228432 申请日期 2005.08.05
申请人 SANYO CHEM IND LTD 发明人 YAMAMOTO YUSUKE;OIKE TAKUO
分类号 G03F7/004;G03F7/033 主分类号 G03F7/004
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