PREPARATION METHOD OF THIN FILM, AND DEPOSITION METHOD OF FINE PARTICLES

摘要

PROBLEM TO BE SOLVED: To realize highly accurate patterning while reducing a cost and time required throughout a process and selectively depositing fine particles on the order of nanometers. SOLUTION: In preparation of a thin film formed by depositing at least fine particles on the surface of a substrate, with attention focused to a fact that the deposition of the fine particles is induced by the irradiated light from the nucleus serving as a so-called starting point, the fine particles are deposited on the surface of the substrate where a nucleus in a nanometer size is formed in advance, and also light is irradiated on it while controlling wavelength of the irradiated light, to thereby selectively depositing the fine particles. COPYRIGHT: (C)2007,JPO&INPIT