发明名称 Illumination optical system, projection/exposure device, micro device manufacturing method, illumination device manufacturing method, projection/exposure device adjustment method, and projection/exposure device manufacturing method
摘要 An object of this invention is to reduce even slight irregularities in illumination that occur after assembly of an optical system. To this end, in an exemplary illumination-optical system, a light source that emits extreme ultraviolet (EUV) light, a collimator, a fly's-eye mirror, and a condenser are positioned, in this stated order. A prescribed illumination area on the emission side of the condenser is irradiated with Köhler illumination. At least one unit mirror, among multiple unit mirrors of the fly's-eye mirror, is a correction mirror that has reflectivity irregularities. The reflectivity irregularities correct a portion of, or all, the illumination irregularities in the illumination area.
申请公布号 US2007041004(A1) 申请公布日期 2007.02.22
申请号 US20040556712 申请日期 2004.05.06
申请人 SUZUKI KENJI 发明人 SUZUKI KENJI
分类号 G03B27/54;G03F7/20;G21K1/06 主分类号 G03B27/54
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