| 摘要 |
<p>PURPOSE: To obtain the subject new compound, a specific biscoumarin-based compound, having sufficient sensitivity to visible ray region, esp. the 2nd harmonic component from argon lasers or YAG lasers, thus useful as e.g. a photosensitizer for visible ray photosensitive resin compositions. CONSTITUTION: This new biscoumarin-based compound is expressed by formula I [R1 -R4 are each H, a (substituted) alkyl, alkenyl, aryl, etc.; R5 and R6 are each H, a halogen, (substituted) alkyl, OH, alkoxyl, aryloxy, sulfonic acid group, etc.; R7 and R8 are each H, a halogen, alkoxyl, carboxyl, a group of formula II (R11 is H, an alkyl, etc.; m and n are each 1-5), etc.; R9 and R10 are each cyano, nitro, carboxyl, etc.]. This compound has sufficient sensitivity to visible ray region, esp. the 2nd harmonic component from argon lasers or YAG lasers, therefore being useful as e.g. a photosensitizer for visible ray photosensitive resin compositions. This compound is obtained by reaction of a 4- diethylaminosalicyl aldehyde of formula III with a compound of formula IV to form a ketone of formula V which is then reacted with malonitrile.</p> |
