发明名称 Semiconductor device including storage node and method of manufacturing the same
摘要 A semiconductor device including storage nodes and a method of manufacturing the same: The method includes forming an insulating layer and an etch stop layer on a semiconductor substrate; forming storage node contact bodies to be electrically connected to the semiconductor substrate by penetrating the insulating layer and the etch stop layer; forming landing pads on the etch stop layer to be electrically connected to the storage node contact bodies, respectively; and forming storage nodes on the landing pads, respectively, the storage nodes of which outward sidewalls are completely exposed and which are arranged at an angle to each other.
申请公布号 US7180118(B2) 申请公布日期 2007.02.20
申请号 US20040830895 申请日期 2004.04.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO CHANG-HYUN;CHUNG TAE-YOUNG;YUN CHEOL-JU;LEE JAE-GOO;LEE JU-YONG
分类号 H01L27/108;H01L21/02;H01L21/20;H01L21/8242;H01L27/02;H01L29/76;H01L31/119 主分类号 H01L27/108
代理机构 代理人
主权项
地址