| 摘要 |
An apparatus for wafer inspection is described, comprising an incident-light illumination device ( 5 ) having an illumination axis and an imaging device ( 9 ) having an image axis, both of which are inclined with respect to one another and are directed onto a region to be inspected of the surface ( 42 ) of a wafer ( 2 ). According to the present invention, the apparatus is characterized in that the incident-light illumination device ( 5 ) and the imaging device ( 9, 19 ) each have associated with them a polarizing means whose transmission axes are oriented at a predetermined angle to one another.
|
