摘要 |
An electron beam emitting apparatus has a first plate with an electron-emitting device 15 , and an electrode 8 opposed to the first plate, and the electrode 8 is applied a potential to accelerate electrons emitted from the electron-emitting device 15 . In the electron beam emitting apparatus, a potential defining region 9 is provided a surface of the first plate on the electrode 8 side and a first potential defining region forming the potential defining region 9 is provided in a projective area of the electrode 8 onto the potential defining region 9 ; and, where d represents a distance between the electrode 8 and the potential defining region 9 , an additional potential defining region is defined in the range of 0.83d in all directions parallel to the first plate from the edge of the projective area of the electrode 8 onto the potential defining region 9 . This stabilizes trajectories of electrons and permits an excellent image to be formed without deviation of light emission positions.
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