发明名称 Method for four direction low capacitance ESD protection
摘要 The invention describes a structure and a process for providing ESD semiconductor protection with reduced input capacitance. The structure consists of heavily doped P+ guard rings surrounding the I/O ESD protection device and the Vcc to Vss protection device. In addition, there is a heavily doped N+ guard ring surrounding the I/O protection device and its P+ guard ring. The guard rings enhance structure diode elements providing enhanced ESD energy discharge path capability enabling the elimination of a specific conventional Vss to I/O pad ESD protection device. This reduces the capacitance seen by the I/O circuit while still providing adequate ESD protection for the active circuit devices.
申请公布号 US7179691(B1) 申请公布日期 2007.02.20
申请号 US20020207545 申请日期 2002.07.29
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 LEE JIAN-HSING;CHEN SHUI HUN YI
分类号 H01L21/332;H01L21/331 主分类号 H01L21/332
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