发明名称 Radiation-sensitive composition
摘要 A radiation-sensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation, and (B) a resin containing a repeating unit having a specific group, which increases the solubility in an alkali developing solution by the action of an acid.
申请公布号 US7179579(B2) 申请公布日期 2007.02.20
申请号 US20030444965 申请日期 2003.05.27
申请人 FUJI PHOTO FILM CO., LTD. 发明人 UENISHI KAZUYA
分类号 G03F7/004;G03F7/039;H01L21/027 主分类号 G03F7/004
代理机构 代理人
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