发明名称 |
Radiation-sensitive composition |
摘要 |
A radiation-sensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation, and (B) a resin containing a repeating unit having a specific group, which increases the solubility in an alkali developing solution by the action of an acid.
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申请公布号 |
US7179579(B2) |
申请公布日期 |
2007.02.20 |
申请号 |
US20030444965 |
申请日期 |
2003.05.27 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
UENISHI KAZUYA |
分类号 |
G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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