发明名称 |
Overlay mark for aligning different layers on a semiconductor wafer |
摘要 |
The present invention provides an overlay mark for aligning different layers on a semiconductor wafer. The overlay mark comprises a bar-in-bar mark and two bar sets on the semiconductor wafer. The bar-in-bar mark comprises an inner bar mark positioned in one of the pre-layer and an outer bar mark positioned in the other pre-layer. The two bar sets are perpendicular to each other, and each of two bar sets comprises two parallel bars. The bars can be connected and the lengths of the bars can be the same or different.
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申请公布号 |
US7180593(B2) |
申请公布日期 |
2007.02.20 |
申请号 |
US20030702797 |
申请日期 |
2003.11.05 |
申请人 |
MACRONIX INTERNATIONAL CO., LTD. |
发明人 |
LIN YEN YU |
分类号 |
G01B11/00;G01B11/27;G03F7/20;H01L23/544 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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