发明名称 Semiconductor processing temperature control
摘要 A temperature control system having a re-circulation loop that uses valves to selectively circulate a temperature control fluid through a cooling system, through a heating system, or through a through passage so as to controlling the temperature of the temperature control fluid, which, in turn, controls the temperature of a target. A temperature sensor monitors the target's temperature. A controller controls valve operation in response to the temperature measured by the temperature sensor to obtain a predetermined target temperature. Beneficially, the controller controls the target's temperature according to a predetermined temperature profile. Continuous etching along a predetermined temperature profile is possible.
申请公布号 US7180036(B2) 申请公布日期 2007.02.20
申请号 US20040983248 申请日期 2004.11.08
申请人 发明人
分类号 H05B1/02;F24F3/00;H01L21/00;H01L21/311;H01L21/768 主分类号 H05B1/02
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