发明名称 |
Halftone phase shift mask blank, and method of manufacture |
摘要 |
A halftone phase shift mask blank has a phase shifter film on a transparent substrate. The phase shifter film is composed of a metal silicide compound containing Mo, at least one metal selected from Ta, Zr, Cr and W, and at least one element selected from O, N and C. The halftone phase shift mask blank has improved processability and high resistance to chemicals, especially to alkaline chemicals. |
申请公布号 |
US7179545(B2) |
申请公布日期 |
2007.02.20 |
申请号 |
US20030679264 |
申请日期 |
2003.10.07 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
OKAZAKI SATOSHI;ISHIHARA TOSHINOBU |
分类号 |
B32B9/00;G03F1/08;C23C14/06;C23C14/08;C23C14/35;G03F1/00;G03F1/32;G03F1/68 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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