| 摘要 |
PROBLEM TO BE SOLVED: To measure the flow of a treatment fluid accurately on the basis of the temperature of the treatment fluid, when it is supplied to a treatment chamber. SOLUTION: When the treatment fluid (for example, a mixed fluid consisting of ozone gas and vapor) is supplied to the treatment chamber 2 in which a semiconductor wafer W, an object under treatment, is treated by the treatment fluid from a treatment fluid supply source (an ozone gas generator 7 and a vapor generator 9) via a treatment fluid supply tube 6, the temperature of the treatment fluid flowing through the treatment fluid supply tube is measured by a temperature sensor 10. This detected signal is transmitted to a CPU 20. The CPU 20 decides that the treatment fluid has reached a predetermined flow, when the temperature of the treatment fluid flowing through the treatment fluid supply tube has reached a predetermined temperature. COPYRIGHT: (C)2007,JPO&INPIT
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