发明名称 DEVICE AND METHOD FOR CORRECTING DEFECT OF PATTERNED SUBSTRATE, AND METHOD FOR MANUFACTURING PATTERNED SUBSTRATE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a defect correction device and a defect correction method capable of reliably correcting defects, and also to provide a method for manufacturing patterned substrate by using the method. <P>SOLUTION: This device for correcting defects on a patterned substrate 6 is provided with: a mask film 5 oppositely disposed on the substrate 6; a laser beam source which emits a laser beam for disposing an opening part on the mask film 5; and a correction means of correcting the defect on the substrate 6 via the opening part disposed on the mask film 5, wherein a correction part corrected by the correction means is pressed by an elastic body 18. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007041480(A) 申请公布日期 2007.02.15
申请号 JP20050228253 申请日期 2005.08.05
申请人 LASERTEC CORP 发明人 ISHIKAWA TAKUJI;SEKI HIROKAZU
分类号 G02B5/20;G03F7/20;G03F7/40;H01L21/027 主分类号 G02B5/20
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