| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition having high sensitivity and capable of forming a high-transmittance color filter reduced in stains on a mask caused in a pattern exposure process, and to provide the color filter with high transmittance. <P>SOLUTION: The photosensitive composition contains a transparent resin, a polyfunctional monomer having three or more ethylenically unsaturated double bonds, and a photopolymerization initiator having photo-subliming property; wherein the compounding ratio of the polyfunctional monomer in the photosensitive composition is 30 to 50 wt.% on the basis of the total weight of the transparent resin, polyfunctional monomer and photopolymerization initiator, the compounding ratio of the photopolymerization initiator in the composition is 13 to 30 wt.% on the basis of the total weight of the transparent resin, polyfunctional monomer and photopolymerization initiator, and the solubility parameter of the transparent resin in the photosensitive composition is higher than the solubility parameter of the polyfunctional monomer by a difference in the range of 0.2 to 1.5. The color filter has a filter segment formed of the photosensitive composition with a colorant compounded therein. <P>COPYRIGHT: (C)2007,JPO&INPIT |
