发明名称 |
PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE COMPOSITION FOR BLUE-VIOLET LASER, IMAGE-FORMING BASE MATERIAL USING THE SAME, IMAGE-FORMING MATERIAL AND IMAGE-FORMING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition which is highly sensitive to laser light, particularly to laser light from ultraviolet to blue-violet, and is excellent in long-term storage stability and adhesion to a substrate, wherein the photosensitive composition is suitably used as a solder resist or a dry film, and in particular it is suitable for direct drawing using laser light from ultraviolet to blue-violet. <P>SOLUTION: The photosensitive composition contains (A) an ethylenically unsaturated group-containing compound, (B) a photopolymerization initiator and (C) an alkali-soluble resin, wherein the photopolymerization initiator (B) contains a photopolymerization initiator having a specific structure and an average particle diameter of 0.001-150 μm. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007041493(A) |
申请公布日期 |
2007.02.15 |
申请号 |
JP20050305074 |
申请日期 |
2005.10.19 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
URANO TOSHIYOSHI;KAMEYAMA YASUHIRO;MIZUKAMI JUNJI |
分类号 |
G03F7/031;C08F2/50;G03F7/004;G03F7/033 |
主分类号 |
G03F7/031 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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