发明名称 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE COMPOSITION FOR BLUE-VIOLET LASER, IMAGE-FORMING BASE MATERIAL USING THE SAME, IMAGE-FORMING MATERIAL AND IMAGE-FORMING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive composition which is highly sensitive to laser light, particularly to laser light from ultraviolet to blue-violet, and is excellent in long-term storage stability and adhesion to a substrate, wherein the photosensitive composition is suitably used as a solder resist or a dry film, and in particular it is suitable for direct drawing using laser light from ultraviolet to blue-violet. <P>SOLUTION: The photosensitive composition contains (A) an ethylenically unsaturated group-containing compound, (B) a photopolymerization initiator and (C) an alkali-soluble resin, wherein the photopolymerization initiator (B) contains a photopolymerization initiator having a specific structure and an average particle diameter of 0.001-150 &mu;m. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007041493(A) 申请公布日期 2007.02.15
申请号 JP20050305074 申请日期 2005.10.19
申请人 MITSUBISHI CHEMICALS CORP 发明人 URANO TOSHIYOSHI;KAMEYAMA YASUHIRO;MIZUKAMI JUNJI
分类号 G03F7/031;C08F2/50;G03F7/004;G03F7/033 主分类号 G03F7/031
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