| 发明名称 |
Atomic layer deposition of tantalum-containing films using surface-activating agents and novel tantalum complexes |
| 摘要 |
Atomic layer deposition processes for the formation of tantalum-containing films on surfaces are provided. Also provided are novel tantalum complexes that can be used as tantalum precursors in the disclosed deposition processes.
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| 申请公布号 |
US2007036894(A1) |
申请公布日期 |
2007.02.15 |
| 申请号 |
US20060497857 |
申请日期 |
2006.08.01 |
| 申请人 |
THOMPSON JEFFERY S;RADZEWICH CATHERINE E |
发明人 |
THOMPSON JEFFERY S.;RADZEWICH CATHERINE E. |
| 分类号 |
C23C16/00;C07F9/00 |
主分类号 |
C23C16/00 |
| 代理机构 |
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| 地址 |
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