发明名称 SEMICONDUCTOR EVALUATION APPARATUS AND SEMICONDUCTOR PROCESSOR
摘要 PROBLEM TO BE SOLVED: To provide the semiconductor evaluation apparatus that can evaluate substrates with a high sensitivity. SOLUTION: The apparatus includes a probe laser Pb that radiates a first probe light moving towards a semiconductor substrate. A first half mirror Mh2 gets a second probe light forming a part of the first probe light from the first probe light. An optical power meter and detector D loads both a first reflection probe light due to the reflection of the first probe light by the semiconductor substrate, and a second reflection probe light due to the reflection of the second probe light by the first reference sample having an internal state for reference, into the same optical axis. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007043019(A) 申请公布日期 2007.02.15
申请号 JP20050228261 申请日期 2005.08.05
申请人 TOSHIBA CORP 发明人 AKUTSU HARUKO
分类号 H01L21/66;H01L21/265 主分类号 H01L21/66
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