发明名称 |
REFERENCE WAFER FOR CALIBRATING SEMICONDUCTOR EQUIPMENT |
摘要 |
A reference wafer for calibrating a laser and a camera and checking laser accuracy and spot size. The reference wafer may include a light absorption layer on a semiconductor substrate and a light reflection layer pattern on the light absorption layer. The light reflection layer pattern may include a first pattern for checking the laser accuracy and spot size and a second pattern for calibrating the laser and camera. A first anti-reflective layer may be introduced between the light absorption layer and the semiconductor substrate, and a second anti-reflective layer may be introduced between the light absorption layer and the light reflection layer pattern.
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申请公布号 |
US2007037078(A1) |
申请公布日期 |
2007.02.15 |
申请号 |
US20060463826 |
申请日期 |
2006.08.10 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE KUN-GU;SEONG KI-HO;LEE YOO-MI |
分类号 |
G03C5/00 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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