| 发明名称 |
EVAPORATION CONTROL USING COATING |
| 摘要 |
A novel arrangement and method for depositing evaporation control agents so as to coat immersion lithographic solutions which are employed on the surface of semiconductor wafers in connection with the etching of the surfaces of the wafer through the intermediary of an immersion lithographic process.
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| 申请公布号 |
US2007034605(A1) |
申请公布日期 |
2007.02.15 |
| 申请号 |
US20050161630 |
申请日期 |
2005.08.10 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CORLISS DANIEL A.;GOLDFARB DARIO L.;HOLMES STEVEN J.;KIMMEL KURT R.;LERCEL MICHAEL J. |
| 分类号 |
B44C1/22;C23F1/00;H01L21/306 |
主分类号 |
B44C1/22 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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