发明名称 NANO PARTICLE DISPERSION LIQUID, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for efficiently manufacturing a semiconductor device having improved electrical performance using a nano particle dispersion liquid. SOLUTION: An oxide semiconductor thin film 22 is formed by using a nano particle dispersion liquid containing a metal oxide nano particle having an average particle size of 50 nm or smaller selected from a compound expressed by an expression I: Zn<SB>X</SB>M<SB>Y</SB>In<SB>Z</SB>O<SB>(X+1.5Y+1.5Z)</SB>(in the expression, M indicates at least one element in aluminum, iron, and gallium; a ratio X/Y ranges from 0.2 to 10; and a ratio Y/Z ranges from 0.1 to 2.5) or an expression I': Zn<SB>X'</SB>In<SB>Z'</SB>O<SB>(X'+1.5Z')</SB>(in the expression, a ratio X'/Z' ranges from 0.5 to 8), and a dispersion medium. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007042690(A) 申请公布日期 2007.02.15
申请号 JP20050222246 申请日期 2005.07.29
申请人 FUJIFILM HOLDINGS CORP 发明人 HIRAI HIROYUKI
分类号 H01L21/368;H01L29/786 主分类号 H01L21/368
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