发明名称 Dicopper (I) oxalate complexes as precursor for metallic copper deposition
摘要 The invention relates to dicopper(I) oxalate complexes stabilised by neutral Lewis bases, such as alkenes or alkynes, and to the use of dicopper(I) oxalate complexes as precursors for the deposition of metallic copper, in which the neutral Lewis bases used are alkynes, alkenes, triarylphosphines, CO or isonitriles.
申请公布号 US2007037003(A1) 申请公布日期 2007.02.15
申请号 US20040554736 申请日期 2004.03.29
申请人 BASF AKTIENGESELLSCHAFT 发明人 KOEHLER KATRIN
分类号 B32B15/00;C07F1/08;H05K3/10 主分类号 B32B15/00
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