发明名称 MASK FOR FILM DEPOSITION, METHOD FOR PRODUCING SPONTANEOUS LIGHT EMITTING PANEL, AND SPONTANEOUS LIGHT EMITTING PANEL
摘要 PROBLEM TO BE SOLVED: To provide a mask for film deposition whose deformation can be easily prevented, to provide a method for producing a spontaneous light emitting panel capable of forming a film deposition pattern at high precision, and to provide a spontaneous light emitting panel in which film deposition panels of high precision are formed. SOLUTION: The mask 1 for film deposition comprises opening patterns 2 formed corresponding to the film deposition regions in an object to be film-deposited, and each opening pattern 2 comprises a reinforcing part 5 for preventing the deformation of the mask for film deposition. Concretely, by providing each opening part 3 with a projecting part 5b as the reinforcing part 5 toward the inside of the opening part, the rigidity (strength) of the mask increases, the deformation of the mask upon film deposition can be reduced, and the film deposition pattern can be formed at high precision. Further, the spontaneous light emitting panel having high display performance can be provided. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007039777(A) 申请公布日期 2007.02.15
申请号 JP20050228105 申请日期 2005.08.05
申请人 TOHOKU PIONEER CORP 发明人 OSHITA ISAMU
分类号 C23C14/04;C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/04
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