| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for correcting a pattern, by which the defective part of the pattern can be quickly corrected by a simple constitution. SOLUTION: The method for correcting the pattern comprises the steps of: jetting an atomized correcting liquid 20 from a coating nozzle 30; moving the coating nozzle 30 relatively to a substrate 13 from a movement starting point A1 on one side of the open defective part 13a of an electrode 13 to a movement stopping point B1 on the other side of the defective part 13a; opening a shutter 31 when the coating nozzle 30 reaches a plotting starting point A0 at one edge of the defective part 13a; and closing the shutter 31 when the coating nozzle 30 reaches a plotting stopping point B0 at the other end of the defective part 13a. As a result, an accumulated layer 32 having the fixed line width can be formed. COPYRIGHT: (C)2007,JPO&INPIT
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