发明名称 Semiconductor memory device with three dimensional solid electrolyte structure and manufacturing method thereof
摘要 The semiconductor memory device includes a variable resistance device having a solid electrolyte in a three-dimensional structure. The variable resistance device includes a first electrode; the solid electrolyte, which has at least two regions with different heights, formed on the first electrode; and a second electrode made of a conductive material formed on the solid electrolyte to cover the regions with different heights. In addition, a multibit semiconductor memory device is provided which includes a bias circuit that can control the intensity of a current and time the current is supplied to the variable resistance device inside a memory cell in multiple steps to configure multibits.
申请公布号 KR100682939(B1) 申请公布日期 2007.02.15
申请号 KR20050021844 申请日期 2005.03.16
申请人 发明人
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
代理机构 代理人
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