| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma generator, a method for generating plasm, and a plasma treatment apparatus where the treatment efficiency of a matter to be treated is high by preventing the reduction of a member of the plasma generator caused by the plasma of reducing gas or gas containing the reducing gas, and suppressing the reduction of the active kind, and charged particles of the reducing gas. <P>SOLUTION: The plasma generator is provided with a first part which has a partition at least partially composed of a dielectric and which has a first space area where an atmosphere of pressure reduced than the earth's atmosphere can be kept, a means for introducing first gas into the first space area, a means for introducing microwaves into the first space area from the outside of the first part through the dielectric, a second part having a second space area provided so as to be connected with the first space area, and a means for introducing second gas into the second space area. <P>COPYRIGHT: (C)2007,JPO&INPIT |
