发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To simultaneously provide ultrahigh sensitivity, excellent developability and a broad heat control width. <P>SOLUTION: An acid group-containing vinyl ester resin and a photopolymerization initiator are used as indispensable components. The acid group-containing vinyl ester resin has a multiple branching molecular structure and is produced by reacting an epoxy vinyl ester resin, obtained by reacting a novolak epoxy resin with acrylic acid, with a polybasic acid anhydride, then reacting the acid group, formed by the reaction, with glycidyl methacrylate, and further reacting the secondary hydroxyl group, formed by this reaction, with a polybasic acid anhydride. The acid group-containing vinyl ester resin contains 1.75-3.5 radically polymerizable unsaturated double bonds per aromatic ring and contains the acid group in such an amount range that the acid value is 30-150 mgKOH/g. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007041502(A) 申请公布日期 2007.02.15
申请号 JP20050378131 申请日期 2005.12.28
申请人 DAINIPPON INK & CHEM INC 发明人 MURATA YOSHIAKI;ITO HIRONOBU
分类号 G03F7/027;C08F290/06;C08G59/16;H05K3/00 主分类号 G03F7/027
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