| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress formation of an end part of an amorphous transparent conductive film in the eaves shape when a laminated conductive film wherein a metal conductive film and the amorphous transparent conductive film are sequentially laminated is patterned. <P>SOLUTION: The manufacturing method of a liquid crystal display 50 having an active matrix substrate 20 provided with a reflection electrode 15a provided for each pixel includes: a laminated conductive film forming step for forming the laminated conductive film 16 by sequentially film-depositing a molybdenum film 8c, an aluminum film 8d and an IZO film 9a on an insulating substrate 10a; and an electrode forming step for forming the reflection electrode 15a by patterning the laminated conductive film 16. The electrode forming step includes: a first etching step for simultaneously etching the molybdenum film 8c, the aluminum film 8d and the IZO film 9a; and a second etching step for etching the end part of an IZO layer 9b exposed by etching in the first etching step by using a BHF (Buffered Hydrogen Fluoride) solution 17. <P>COPYRIGHT: (C)2007,JPO&INPIT |
