发明名称 SUBSTRATE CLEANING METHOD AND DEVICE
摘要 PROBLEM TO BE SOLVED: To uniformly clean many areas around the central part of a disc-like substrate by using a discharging part provided with a slit-like discharging port, and to reduce the dose of a cleaning liquid. SOLUTION: The substrate cleaning device 1 includes a holder 2 to hold a disc-like substrate 9, a rotary mechanism 3 to turn the substrate 9, a discharging part 4, and a scanning mechanism 5 to move the discharging part 4 in the scanning direction. The discharging part 4 includes a slit-like discharging port 41, and it discharges a cleaning liquid to a linear discharging area on the main surface of the substrate 9. The substrate cleaning device 1 repeats a scanning/cleaning step wherein the discharging area is scanned and cleaned in the main surface of the substrate 9 while turning of the substrate 9 is being stopped, by turning the substrate 9 by a specified angle only. Then, the substrate 9 can be entirely cleaned and its central area can be uniformly cleaned, and the dose of a cleaning liquid can be reduced. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007042742(A) 申请公布日期 2007.02.15
申请号 JP20050222996 申请日期 2005.08.01
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MIYAGI MASAHIRO;HIRAE SADAO
分类号 H01L21/304;B08B3/02;B08B3/12;G02F1/13;G02F1/1333 主分类号 H01L21/304
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