发明名称 Semiconductor nanostructures and fabricating the same
摘要 During the growth of semiconductor nanowires on a substrate, different respective vapor-liquid-solid reactions that respectively form target segments and sacrificial segments of the semiconductor nanowires at growth locations defined by catalyst particles are supported. The sacrificial segments of the semiconductor nanowires are selectively removed to form semiconductor nanostructures corresponding to the target segments of the semiconductor nanowires.
申请公布号 US2007037365(A1) 申请公布日期 2007.02.15
申请号 US20050203758 申请日期 2005.08.15
申请人 RANGANATH TIRUMALA R;YI SUNGSOO;MCALLISTER WILLIAM H 发明人 RANGANATH TIRUMALA R.;YI SUNGSOO;MCALLISTER WILLIAM H.
分类号 H01L21/20;H01L21/36 主分类号 H01L21/20
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