发明名称 Defect inspection apparatus, sensitivity calibration method for the same, substrate for defect detection sensitivity calibration, and manufacturing method thereof
摘要 A reference substrate for defect detection sensitivity calibration has: patterns and programmed defective portions which are cone defects with different sizes and are formed at random on a silicon substrate. By using reference substrate for defect detection sensitivity calibration, it is possible to obtain an index, usable in manufacturing management, for determining sensitivity adjustment after a lamp is replaced in an illumination part of a defect inspection apparatus.
申请公布号 US2007035725(A1) 申请公布日期 2007.02.15
申请号 US20050287314 申请日期 2005.11.28
申请人 FUJITSU LIMITED 发明人 TAKAHASHI NAOHIRO;YASUMOTO TAMIHIDE
分类号 G01N21/00;G01J1/10 主分类号 G01N21/00
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