| 发明名称 |
SPUTTER TARGETS AND METHODS OF FORMING SAME BY ROTARY AXIAL FORGING |
| 摘要 |
<p>A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.</p> |
| 申请公布号 |
EP1751324(A1) |
申请公布日期 |
2007.02.14 |
| 申请号 |
EP20050755181 |
申请日期 |
2005.05.06 |
| 申请人 |
CABOT CORPORATION |
发明人 |
MATERA, JOHN, P.;FORD, ROBERT, B.;WICKERSHAM, CHARLES, E., JR. |
| 分类号 |
C23C14/34;C22C14/00;C22C16/00;C22C27/02;C22F1/08;C22F1/16;C22F1/18 |
主分类号 |
C23C14/34 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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