| 摘要 |
<p>The present invention provides a method of analysis enabling easy and suitable analysis of measurement data relating to the production of devices and dependent on the recipe or combination of processing units. According to the method, for example the line width precision, overlay precision, and other characteristics of the results of exposure are detected from the results of exposure for different lots and those characteristics are classified linked with for example the recipes at the time of the exposure processing exhibiting those characteristics and the processing units or combinations thereof in the exposure apparatus or track. Further, based on the classified results, whether the characteristics of the results of exposure are dependent on the specific recipe or processing units is judged. When there is dependency, when a lot using that recipe or processing unit is subsequently loaded, a warning is issued or automatic correction is performed to prevent processing with poor precision.</p> |
