An improved CPL mask and a method and program product for generating the same

摘要

A method of generating a mask for printing a pattern including a plurality of features. The method includes the steps of obtaining data representing the plurality of features; and forming at least one of the plurality of features by etching a substrate (40) to form a mesa (42) and depositing a chrome layer (44) over the entire upper surface of the mesa, where said mesa has a predetermined height.