| 摘要 |
A near-field scanning optical microscope system exposes photoresist on a substrate. The system includes an NSOM probe, and translational stages capable of moving one of the probe and the substrate such that the probe traverses, in continuous motion, over the entire substrate. Another near-field scanning optical microscope system exposes photoresist on a substrate using an array of NSOM probes. Methods for exposing photoresist on a substrate include the steps of translating a surface of the substrate across an NSOM probe (or an array of NSOM probes) in continuous motion.
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